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Ion beam-assisted deposition is a process
carried out under high vacuum in which a vapor-deposited coating is bombarded
with energetic ions from an ion source. Mixing of atoms at the
coating-substrate interface as a result of collisions with impinging
ions leads to improved adhesion. The
Denton Ion Beam system specializes in:
• High density
Films
• Environmental
stability
• Stable
deposition rates
• Stoichiometry
control
Ion Beam Etch
and Reactive Ion Etch can be equipped with DC or RF power supplies. The
Denton Ion Beam Etch and Reactive IOn Etch is excellent for metal etch
and dielectric applications.
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