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DC Plasma Generator 
Advanced Energy

Power Supplies for Plasma Processes
DC Power Supply
DC Pulsed Power
 
Advanced Energy manufactures DC Power Supplies for all power levels for vacuum coating. In sputtering applications, target yield, deposition rate and target poisoning are process issues that Advanced Energy Plasma Generators address.

Mainly used with physical vapor deposition (PVD) processes-both complex metallic sputtering and in combination with a reactive gas to form thin-film dielectric layers. AE's DC power products have been used in varied manufacturing markets, including: 
  • Semiconductor (copper, aluminum, tantalum, titanium, and newer exotic materials) 
  • Flat panel display (thin-film transistor, color filter, organic LEDs) 
  • Data storage (optical storage, magnetic storage, and combinations of magneto-optical storage) 
  • Solar photovoltaic cell (transparent conductive oxides and Si deposition) 
  • Architectural glass 
  • Advanced product applications (thin films for optics, tool coating, plastics, etc.)

Advanced Energy Line-Up of DC Plasma Power Supplies

Pinnacle Series- Provides remarkable consistency at the lowest installed and operating costs. The arc management features provide the fastest arc suppression on the market. Compact versatile package provides the widest full power impedance range in the industry.

Pinnacle Series Product Information


Pinnacle Plus+ Pulsed-DC Power Supplies- The choice for reactive sputtering, this pulsed supply offers high deposition rates and repeatable performance. Provides high film quality at an attractive price compared to AC supplies. Available in 5K, 10K and dual 5K configurations.

Pinnacle Plus+ Pulsed-DC Power Supplies Product Information
Pinnacle 3000 - Compact 3000 W 2U power package, providing the highest efficiency and power factor available. This results in the lowest operating cost available. Versitile in both process and bias applications.

Pinnacle 3000 Product Information
Pinnacle Diamond  - The most cost efficient 15KW power package available. Versitile in process and bias applications. Offers fast configurable arc response. Available in a 3U 1/2 rack configuration.

Pinnacle Series Product Information

 

 
MDX Series 500 W - Designed for continuous hard use in a vacuum environment. A leading performer in magnetron sputtering, DC sputtering with RF bias, and DC biased RF sputtering. Well suited small scale production and laboratory applications.

MDX Series 500 W Product Information
MDX Series 1 kW and 1.5 kW - Tight regulation and superior arc quenching, along with low stored power output energy, make this an industry leader. These are most commonly used in magnetron sputtering applications. The compact design makes this supply popular in laboratory applications.

MDX Series 1 kW and 1.5 kW Product Information
E'Wave Bipolar Pulsed-DC Series - This bi-polar pulsed DC power supply improves surface uniformity, reduces additive consumption for the copper-plating phase of dual-damascene process flow (DDPF) applications, including wafer electroplating in a production environment and copper process development. E'Wave power supply offers up to three channels, each of which has an independently driven bipolar power source and is capable of producing, storing, and running up to 15 current-controlled or voltage-controlled waveforms

                              E'Wave Bipolar Pulsed-DC Series Product Information
 
Application Notes and Reference
Guidelines for Using a Pulsar  DC Pulsing Accessory with an SCR-Fired DC Power Supply

Pulsar  High-Power DC Pulsing Accessory (2006) application note    

Arc Handling in RF-Superimposed DC Processes (2006) application note
 

Increasing Production Output with Pulsed-DC Accessories (2006) white paper
 

Signal Integrity for Vacuum Processing Systems (2003) white paper
 

 

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