Power Supplies
for Plasma Processes
DC Power Supply
Low to Mid Frequency
Low to Mid Frequency Plasma Generators offer highly efficient plasma
generators for improved process control for a wide variety of
applications.
PDX
Mid-Frequency Power Supplies - The PDX
Series low power (1250 and 1400W) and the high power (5000 and 8000W)of
mid frequency power supplies offer a robust, compact and highly
efficient plasma generator. These power supplies provide a wide
operating frequency range providing optimized process control.
PEII
Low-Frequency Series - The Low Frequency
PEII Power Supply provides 40KHz pulse width modulation (PWM). The PEII
provides advanced arc control and internal load matching to power levels
to 60kW. The PEII comes in 5kW and 10kW options with master slave up to
the 60kW.
LFGS
RF Generators
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The versatile, variable-frequency
LFGS RF generator (1250 W, 40 to 500 kHz) suits a wide variety of
semiconductor and general plasma-processing applications, including
sputtering, reactive ion etching, plasma deposition, polymerization, and
surface treatment.
Crystal�
The Crystal resonant-circuit
power supply is well suited to the large area glass coating applications
such as automotive, architectural, anti-reflective and mirror
applications. Available in 60, 120 and 180kW power levels, the crystal
provides low-arc energy and compensates for plasma variations-
increasing throughput and maximizing target utilization.