Schoonover, Inc. - Vacuum Equipment

Vacuum Equipment - Electron Beam Equipment

E Beam Equipment

Electron Beam Evaporators

Ferrotec offers a range of single hearth and multihearth guns for a wide range of deposition requirements.

All Ferrotec electron beam guns feature:

Long filament life - an asymmetrical emitter configuration virtually eliminates harmful ion bombardment effects on the filament.
Stable spot - a thicker filament with short legs guarantees a stable spot over the total life time of the filament.
Ease of maintenance - the emitter assembly is easily removed and the filament change is done outside the vacuum system.

Single Hearth Evaporators

Single hearth evaporators are available in HV and UHV configurations. Four sizes are available with differing maximum powers and hearth sizes.

Model	EV 1-8	EV 1-40	EV 1-63	EV 1-100
Hearth Volume	up to 8cc	40cc	63cc	100cc
Max. Power	5kW	10kW	12kW	10kW
Dimensions (HxWxL)*	70x70x115	95x114x190	105x107x150	95x114x190
Part No	1-65 40 00	1-68 40 00	1-67 10 00	1-68 10 00

Multi Hearth Evaporators

Ferrotec offers a selection of multi-hearth evaporators to suit every budget and application. For each evaporator, a variety of standard and custom hearths are available.

EV M-6 and EV M-8

The EV M-6 and M-8 are professional multi-hearth sources for optical and other high precision applications. The EV M-6 has a maximum power of 6kW and the EV M-8 can be used at powers of up to 10kW. These evaporators offer a small beam spot regardless of position in the pocket and extremely homogenous material depletion. This makes them ideal for precision applications such as optical coating.

Electron Beam Controllers

The programmable Genius deposition controller regulates all aspects of the electron beam deposition process. As well as controlling the high voltage and regulating the filament supply, the Genius also handles the magnet current supply to the coils of the electron beam evaporator.

All of the Genius functions are included on the remote control which can be used to manually set and control the evaporation process as well as to set all process and system parameters.

Access to the menu functions may be limited with three password protected user levels.

In order to achieve the best in film quality and uniform evaporant utilization, the genius can store a wide variety of evaporation parameters. Different data sets can then be applied to different phases of the process (eg. material melting and various coating phases). In addition to storing various beam sweep parameters, different high voltage values may also be set.

The Genius, used with a Carrera series power supplies allows up to three electron beam sources to be run from a single power supply.

Simultaneous Deposition

For simultaneous evaporation from several electron beam evaporators each source is driven by a single Genius unit. As the emission current is directly recorded by the filament power supply FPS-II, the evaporators can be powered from a single Carrera high voltage power supply.

Sequential Deposition

A Filament switch card can be fitted to the genius to enable selection and deposition from one of several evaporators within the vacuum chamber. For such a configuration each evaporator will require a dedicated filament power supply.

Power Supplies

The Carrera series of power supplies uses primary switched mode technology to offer high efficiency and fast arc detection and recovery in a compact unit. Based on a modular design, the Carrera can be configured for maximum outputs ranging from 3kW to 15kW.

Features

Output power from 3 kW to 15 kW
Sequential or simultaneous supply for up to three evaporators
Primary switched mode power supply
Arc detection and suppression within 1 �s
Full arc recovery within 3 ms
Controllable arc management system
Continuously variable high voltage supply from 4 kV to 10 kV
Compact design
CE certified

Modular Design

Through the introduction of additional 5 kW units, the output power of the standard Carrera 5 can be extended up to 15 kW. This enables, for the first time, higher power applications to benefit from primary switched technology. A load share arrangement ensures that the power output is equally sourced where more than one 5kW unit is installed

ARC Management

Through a combination of an intelligent arc recognition system and the high switching frequency of the power unit, it is ensured that should any arcs occur they are extinguished extremely quickly. This minimizes the additional energy that would otherwise continue to feed into the arc. Full power is returned within 3 ms to allow the evaporation process to continue. With the aid of a user-set limit for the acceptable arc rate, process integrity can be maintained for processes such as ion assisted deposition.

Arc detection time tdetect 200 ns

Power down time tdown 1 �s

Arc off time toff 1 ms

Arc recovery time trec ~ 3 ms