Vacuum Equipment - Electron Beam Equipment- Ion Beam Deposition Sources

Saintech Ion Beam Sources

Saintech Ion Beam Systems

Gridless (end-hall) Ion Sources

 Ion assisted deposition (IAD)

 Direct deposition (eg DLC films)

 Biased target ion beam deposition (BTIBD)

 Substrate cleaning

The Telemark Saintech Ion System has been designed for high power and large vacuum coating applications. The Saintech Ion Beam Deposition System is gridless, compact and robust. There are two models the ST3000 and ST55 with usage of either dependant on the energy beam needed for the vacuum process.

The ST55 and Ion Assisted Deposition- The IAD of thin film growth is a proven technique that provides dense and highly stable films without need of additional substrate heating. The ST55 has further enhanced the IAD process to include deposition onto a wide variety of glasses, plastics and metals. The ST55 provides unparalleled film adhesion for both metal and non-metal films.

Case Study of the Saintech Ion Beam Systems

SVC Paper- Characterization of a High Output Gridless Ion Source

Saintech ST3000 

-Output Power 2.5KW

- Chamber size greater than 1000mm

- Switch between gases or mix in your desired ratio

- Dual Filament with auto switching

ST3000 Features:

• Ion beam energies up to 300eV.
• Ion beam currents to 13 amps max.
• Full-time use of high purity oxygen.
• Highly efficient design greatly reduces gas load.
• Water-cooled to reduce maintenance and radiation load and allow immediate venting of chamber upon completion of deposition.
• Extremely low maintenance. The patented design utilizes a specially coated anode, which resists build-up of electrically insulating oxide coatings.
• Extremely stable operation in IAD processes due to patented electrode design.
• Broad - beam divergence for large area coverage with a uniform ion flux.
• Pulse-mode operation for ion-assistance of radiation-sensitive film materials such as many commonly used infrared and UV thin film materials eg MgF2 & LaF2. For further information please refer to separate information sheets.
• Remote Control - a front panel switch toggles control from local operator to remote master control and monitoring of all operational parameters.

Saintech ST3000 Product Literature

- Cost effective solution for smaller chambers

- Dense film deposition without substrate heating

- Unparalleled adhesion for metal and non-metal thin films

ST55 Features:

• Ion beam energies up to 200eV.
• Beam currents to max of 6 amps.
• Full-time use of high purity oxygen.
• Highly efficient gas injection design greatly reduces gas load.
• Direct water-cooling to reduce maintenance and radiation load and allow immediate venting of chamber upon completion of deposition.
• Extremely low maintenance. The patented design utilizes a specially coated anode, which resists build-up of electrically insulating oxide coatings.
• Extremely stable operation in IAD processes due to patented electrode design.
• Broad - beam divergence for large area coverage with a uniform ion flux.
• Pulse-mode Operation for ion-assistance of radiation-sensitive film materials such as many commonly used infrared and UV thin film materials eg MgF2 & LaF2. For further information please refer to separate information sheets.
• Remote Control & Monitoring of process parameters. A front panel control toggles control from local operator to remote master control and monitoring of all operational parameters.

Saintech ST55 Product Literature

ST55 Density Profile Application Note